The Minteq Pyrogenics Group is the largest producer of PYROID® pyrolytic graphite and finished pyrolytic graphite components in North America. We fabricate the largest sized components. The material's unique structure imparts plasma and chemical erosion resistance in ion milling machines and semiconductor etching cathodes. The glass-friendly surface of pyrolytic graphite allows it to contact and shape semi-molten glass without marring the surface.
Ion implantation uses two or three closely spaced multiple-aperture electrodes to extract ions from a source and eject them into a collimated beam. The electrodes are called "grids" because they are perforated with a large number of small holes in a regular array. A series of grids constitute an "ion optics" focusing system.
Ion impact erosion of the ion optics is the primary mechanism limiting the life of the ion grids. The erosion of the grid eventually weakens it to the point that the grid fails and breaks causing unnecessary and costly production down time.
Benefits of Pyrolytic Graphite
Pyrolytic graphite ion grids and film offer major benefits relative to alternative materials such as molybdenum and other graphite-based infiltrated material.
PYROID® pyrolytic graphite offers:
- Lowest erosion rate of any material
Customer Benefit:
Ion grids of Pyroid® pyrolytic graphite offer low erosion potential, which provides longer life and more precise beam focus. Our grids can lower maintenance and decreases production down time, thereby saving costs.
PYROID® pyrolytic graphite offers superior physical properties.
- Zero porosity
Customer Benefit:
Zero porosity translates into little or no outgassing of contaminants and no structure capable of trapping contaminants that can alter the dopant effect on the implantation.
- Near zero coefficient of thermal expansion
PYROID® pyrolytic graphite has a coefficient of thermal expansion of essentially zero. Temperature gradient effects on the ion grids are negligible.
Customer Benefit:
Near zero thermal expansion means the grids maintain their relative spacing across a range of temperature and energy settings. This translates into more precise control for depositing dopant atoms into the substrate.
- Single crystal structure (versus material with grains)
Customer Benefit:
The absence of granular components means drop out rates at or below 10 per wafer—far below commercial graphite, and approaching that of silicon. In addition, any particulates generated are <0.1 µ and drop out distribution is uniform. This means better quality at the end of each implantation run.
Ion Implant Applications
- Ion grids
- Ion stripper foil
- Sputtering targets
- Crucibles
- Fixtures
PYROID® pyrolytic graphite is useable throughout the entire ion beam line.
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